Evaluation of lateral barrier height of inhomogeneous photolithography-fabricated Au/n-GaAs Schottky barrier diodes from 80 K to 320 K

dc.contributor.authorKorucu, D.
dc.contributor.authorEfeoglu, H.
dc.contributor.authorTurut, A.
dc.contributor.authorAltindal, S.
dc.date.accessioned2025-05-10T19:43:08Z
dc.date.issued2012
dc.departmentİstanbul Medeniyet Üniversitesi
dc.description.abstractIn order to evaluate current conduction mechanism in the Au/n-GaAs Schottky barrier diode (SBD) some electrical parameters such as the zero-bias barrier height (BH) Phi(bo)(I-V) and ideality factor (n) were obtained from the forward bias current-voltage (I-V) characteristics in wide temperature range of 80-320 K by steps of 10K. By using the thermionic emission (TE) theory, the Phi(bo)(I-V) and n were found to depend strongly on temperature, and the n decreases with increasing temperature while the Phi(bo)(I-V) increases. The values of Phi(bo) and n ranged from 0.600 eV and 1.51(80 K) to 0.816 eV and 1.087 (320 K), respectively. Such behavior of Phi(bo) and n is attributed to Schottky barrier inhomogeneities by assuming a Gaussian distribution (GD) of BHs at Au/n-GaAs interface. In the calculations, the electrical parameters of the experimental forward bias I-V characteristics of the Au/n-GaAs SBD with the homogeneity in the 80-320 K range have been explained by means of the TE, considering GD of BH with linear bias dependence. (c) 2012 Elsevier Ltd. All rights reserved.
dc.description.sponsorshipTubitak
dc.description.sponsorshipThis work is supported by Tubitak and Author also thanks to Dr. R. Airey for diode fabrication in Sheffield University EARSC Centre.
dc.identifier.doi10.1016/j.mssp.2012.03.005
dc.identifier.endpage485
dc.identifier.issn1369-8001
dc.identifier.issn1873-4081
dc.identifier.issue5
dc.identifier.scopus2-s2.0-84863783501
dc.identifier.scopusqualityQ1
dc.identifier.startpage480
dc.identifier.urihttps://doi.org/10.1016/j.mssp.2012.03.005
dc.identifier.urihttps://hdl.handle.net/20.500.14730/10491
dc.identifier.volume15
dc.identifier.wosWOS:000307142500004
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier Sci Ltd
dc.relation.ispartofMaterials Science in Semiconductor Processing
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WOS_20250302
dc.subjectSchottky barrier inhomogeneity
dc.subjectPhotolithography
dc.subjectFlat band barrier height
dc.subjectTo anomaly
dc.subjectTemperature dependence
dc.subjectIdeality factor
dc.subjectBarrier height
dc.subjectEffective barrier height
dc.titleEvaluation of lateral barrier height of inhomogeneous photolithography-fabricated Au/n-GaAs Schottky barrier diodes from 80 K to 320 K
dc.typeArticle

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