Evaluation of lateral barrier height of inhomogeneous photolithography-fabricated Au/n-GaAs Schottky barrier diodes from 80 K to 320 K
| dc.contributor.author | Korucu, D. | |
| dc.contributor.author | Efeoglu, H. | |
| dc.contributor.author | Turut, A. | |
| dc.contributor.author | Altindal, S. | |
| dc.date.accessioned | 2025-05-10T19:43:08Z | |
| dc.date.issued | 2012 | |
| dc.department | İstanbul Medeniyet Üniversitesi | |
| dc.description.abstract | In order to evaluate current conduction mechanism in the Au/n-GaAs Schottky barrier diode (SBD) some electrical parameters such as the zero-bias barrier height (BH) Phi(bo)(I-V) and ideality factor (n) were obtained from the forward bias current-voltage (I-V) characteristics in wide temperature range of 80-320 K by steps of 10K. By using the thermionic emission (TE) theory, the Phi(bo)(I-V) and n were found to depend strongly on temperature, and the n decreases with increasing temperature while the Phi(bo)(I-V) increases. The values of Phi(bo) and n ranged from 0.600 eV and 1.51(80 K) to 0.816 eV and 1.087 (320 K), respectively. Such behavior of Phi(bo) and n is attributed to Schottky barrier inhomogeneities by assuming a Gaussian distribution (GD) of BHs at Au/n-GaAs interface. In the calculations, the electrical parameters of the experimental forward bias I-V characteristics of the Au/n-GaAs SBD with the homogeneity in the 80-320 K range have been explained by means of the TE, considering GD of BH with linear bias dependence. (c) 2012 Elsevier Ltd. All rights reserved. | |
| dc.description.sponsorship | Tubitak | |
| dc.description.sponsorship | This work is supported by Tubitak and Author also thanks to Dr. R. Airey for diode fabrication in Sheffield University EARSC Centre. | |
| dc.identifier.doi | 10.1016/j.mssp.2012.03.005 | |
| dc.identifier.endpage | 485 | |
| dc.identifier.issn | 1369-8001 | |
| dc.identifier.issn | 1873-4081 | |
| dc.identifier.issue | 5 | |
| dc.identifier.scopus | 2-s2.0-84863783501 | |
| dc.identifier.scopusquality | Q1 | |
| dc.identifier.startpage | 480 | |
| dc.identifier.uri | https://doi.org/10.1016/j.mssp.2012.03.005 | |
| dc.identifier.uri | https://hdl.handle.net/20.500.14730/10491 | |
| dc.identifier.volume | 15 | |
| dc.identifier.wos | WOS:000307142500004 | |
| dc.identifier.wosquality | Q2 | |
| dc.indekslendigikaynak | Web of Science | |
| dc.indekslendigikaynak | Scopus | |
| dc.language.iso | en | |
| dc.publisher | Elsevier Sci Ltd | |
| dc.relation.ispartof | Materials Science in Semiconductor Processing | |
| dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | |
| dc.rights | info:eu-repo/semantics/closedAccess | |
| dc.snmz | KA_WOS_20250302 | |
| dc.subject | Schottky barrier inhomogeneity | |
| dc.subject | Photolithography | |
| dc.subject | Flat band barrier height | |
| dc.subject | To anomaly | |
| dc.subject | Temperature dependence | |
| dc.subject | Ideality factor | |
| dc.subject | Barrier height | |
| dc.subject | Effective barrier height | |
| dc.title | Evaluation of lateral barrier height of inhomogeneous photolithography-fabricated Au/n-GaAs Schottky barrier diodes from 80 K to 320 K | |
| dc.type | Article |
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