The origin of forward bias capacitance peak and voltage dependent behaviour of gold/p-type indium phosphide Schottky barrier diode fabricated by photolithography

dc.authorid0000-0002-3091-3746
dc.contributor.authorKorucu, D.
dc.contributor.authorDuman, S.
dc.contributor.authorTurut, A.
dc.date.accessioned2025-05-10T19:43:09Z
dc.date.issued2015
dc.departmentİstanbul Medeniyet Üniversitesi
dc.description.abstractThe admittance measurements which include the capacitance voltage (C-V) and conductance voltage (G/omega-V) characteristics of gold/p-type indium phosphide (Au/p-InP) Schottky barrier diodes (SBDs) were conducted by taking into account the interface states (N-ss) and series resistance (R-s) effects in the temperature range of 80-320 K with a steps of 20 K. Experimental results confirm that the N-ss and R-s are important parameters which strongly influence the main electrical parameters of SBD. The C-V plots for each temperature exhibit the increasing behaviour in depletion region and then give an anomalous peak such that peak position shifts toward positive bias region with increasing temperature due to the re-structuring and re-ordering of surface charge under the temperature effect and the existence of a series resistance (Re). In addition, C takes negative values in the inversion region at edge, which is known as negative capacitance (NC) behaviour. The effect of R-s on the C-V plot is found considerably high at low temperatures in the accumulation region. Therefore, both the measured capacitance (C-m) and conductance (G(m)/omega) were corrected to obtain the real diode capacitance (C-c) and conductance (G(c)/omega). In addition, R-s and N-ss values decrease with increasing temperature. Such behaviour of R-s and N-ss can be attributed to the trap charges which have sufficient energy to escape from the traps located at gold/p-type indium phosphide (Au/p-InP) interface. (C) 2014 Elsevier Ltd. All rights reserved.
dc.identifier.doi10.1016/j.mssp.2014.10.043
dc.identifier.endpage399
dc.identifier.issn1369-8001
dc.identifier.issn1873-4081
dc.identifier.scopus2-s2.0-84911366370
dc.identifier.scopusqualityQ1
dc.identifier.startpage393
dc.identifier.urihttps://doi.org/10.1016/j.mssp.2014.10.043
dc.identifier.urihttps://hdl.handle.net/20.500.14730/10494
dc.identifier.volume30
dc.identifier.wosWOS:000347266900054
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier Sci Ltd
dc.relation.ispartofMaterials Science in Semiconductor Processing
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WOS_20250302
dc.subjectSemiconductors: InP
dc.subjectSchottky diode
dc.subjectInterface states
dc.titleThe origin of forward bias capacitance peak and voltage dependent behaviour of gold/p-type indium phosphide Schottky barrier diode fabricated by photolithography
dc.typeArticle

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