Dielectric, conduction and interface properties of Au/Pc/p-Si Schottky barrier diode

dc.authorid0000-0002-9716-4444
dc.contributor.authorAltindal, Ahmet
dc.contributor.authorCoşkun, Mustafa
dc.contributor.authorBekaroglu, Ozer
dc.date.accessioned2025-05-10T19:43:45Z
dc.date.issued2012
dc.departmentİstanbul Medeniyet Üniversitesi
dc.description.abstractThe dielectric properties and the ability of binuclear zinc(II)phthalocyanine of clamshell type compound in passivating silicon (Si) surfaces is studied by fabricating metal-insulator-semiconductor (MIS) capacitors. The frequency and temperature dependence of the dielectric constant were discussed in the light of Koops model and hopping conduction mechanism. A detailed study of the effect of temperature on the ac conductivity of MIS structure at the temperatures between 300 K and 460 K was carried out. Based on the existing theories of ac conduction, it has been concluded that for low frequency region the dominant conduction mechanism in the sample is quantum mechanical tunneling at all temperatures, whereas for intermediate frequency region multihopping process is the dominant conduction mechanism. At higher frequencies, the behavior and the values of index s reveal a free band conduction mechanism. Interface properties of the fabricated MIS structure were investigated by means of conductance-voltage (G(M)-V-G) and the combination of low frequency and high frequency capacitance-voltage (C-M-V-G) measurements at various fixed frequencies. The values of D-it obtained from conductance and high-low frequency capacitance measurements are 4.25 x 10(11) eV(-1) cm(-2) and 4.90 x 10(11) eV(-1) cm(-2), respectively. This indicates the consistency of both the methods. The observed peaks in the G(M)-V-G characteristics indicated that the losses are predominantly due to interface states. (C) 2012 Elsevier B.V. All rights reserved.
dc.identifier.doi10.1016/j.synthmet.2012.01.002
dc.identifier.endpage482
dc.identifier.issn0379-6779
dc.identifier.issue5-6
dc.identifier.scopus2-s2.0-84858437094
dc.identifier.scopusqualityQ1
dc.identifier.startpage477
dc.identifier.urihttps://doi.org/10.1016/j.synthmet.2012.01.002
dc.identifier.urihttps://hdl.handle.net/20.500.14730/10705
dc.identifier.volume162
dc.identifier.wosWOS:000302978500011
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier Science Sa
dc.relation.ispartofSynthetic Metals
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WOS_20250302
dc.subjectClamshel
dc.subjectDielectric
dc.subjectMIS structure
dc.subjectInterface trap
dc.subjectTunneling
dc.titleDielectric, conduction and interface properties of Au/Pc/p-Si Schottky barrier diode
dc.typeArticle

Dosyalar

Orijinal paket

Listeleniyor 1 - 1 / 1
Yükleniyor...
Küçük Resim
İsim:
10705.pdf
Boyut:
651.45 KB
Biçim:
Adobe Portable Document Format